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总览 评价 陈斌杰 1, , 孙岩 2, , 杨楠 2, , 钟妮 2, , 张媛媛 2, , 白伟 2, , 孙琳 2, , 唐晓东 2, , 杨平雄 2, , 向平华 1,* , 段纯刚 2, ( 1、 华东师范大学,电子工程系,极化材料与器件教育部重点实验室,上海 200241; 2、 Key
陈斌杰1,, 孙岩2,, 杨楠2,, 钟妮2,, 张媛媛2,, 白伟2,, 孙琳2,, 唐晓东2,, 杨平雄2,, 向平华1,*, 段纯刚2,
(
1、华东师范大学,电子工程系,极化材料与器件教育部重点实验室,上海 200241; 2、Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University, Shanghai 200241; )
摘要:
本文运用脉冲激光沉积方法,在多种氧分压(PO2)条件下,于(001)取向的铝酸镧(LaAlO3)衬底上制备了含氧空位的镍酸钐(SmNiO3-δ)外延薄膜。实验结果表明,随着氧分压从26Pa变化到0.5Pa,镍酸钐薄膜的金属-绝缘体相变温度(TMI)从350K逐渐向85K移动。TMI的降低可归因于面外的Ni-O-Ni键角随PO2降低而增大。同时,在PO2 > 3 Pa的条件下,可以在200K附近的绝缘相中进一步观测到电阻率的异常变化,这表明镍晶格的反铁磁序的发生。结合以上结果,本文绘制了含氧空位的镍酸钐薄膜的电子相图。
关键词:
物理电子学;镍酸盐薄膜;电子输运;金属-绝缘体相变;氧空位
CHEN Binjie, SUN Yan, YANG Nan, ZHONG Ni, ZHANG Yuanyuan, BAI Wei, SUN Lin, TANG Xiaodong, YANG Pinxiong, XIANG Pinghua*, DUAN Chungang
(
Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University, Shanghai 200241; )
Abstract:
Epitaxial SmNiO3-δ thin films were fabricated under various oxygen partial pressures (PO2) on (001)-oriented LaAlO3 substrates by pulsed laser deposition method. Continuous control of the metal-insulator transition temperature (TMI) from 350 K to 85 K has been achieved by varying PO2 from 26 Pa to 0.5 Pa. The reduction of TMI can be attributed to the straightening out of the out-of-plane Ni-O-Ni bond angle due to the elongation of unit cell volume with decrease of PO2. When PO2 > 3 Pa, the resistivity anomalies around 200 K are observed in the insulating phase of strained SmNiO3-δ films, suggesting the onset of antiferromagnetic ordering of the Ni sublattices. Based on the results of the transport measurements, an electronic phase diagram of the oxygen deficient SmNiO3-δ films has been established in this work.
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